HafniaLab

Design multilayer dielectrics from plain language — HfO₂/SiO₂ stacks, spectral targets, and electric-field aware high-LIDT refinement.

Download HafniaLab.zipDownload Windows app (.exe)zip / exe are optional local packages (may be absent on the public web deploy) · the designer itself runs in the browser

Export/Import Excel: Layer #, Material, Thickness (nm). Layer 1 faces air.

Film dispersion (Cauchy)

n(λ) = A + B/λ² + C/λ⁴ with λ in µm. Defaults from refractiveindex.info. Edit to match your ellipsometry / process values, then Design or Apply plots.

e-beam HfO₂ film Cauchy on refractiveindex.info. IBS films are often denser (n≈1.95–2.05 @ 1 µm) — edit A/B/C to match your run.

Cauchy fit to Malitson fused silica (VIS–NIR). Substrate uses the exact Sellmeier.

Preview @ 1053 nm: n(HfO₂)=1.8811 · n(SiO₂)=1.4497Substrate fused silica stays Malitson Sellmeier (refractiveindex.info).